The 1UDH ion implanter was manufacture by National Electrostatics Corp. It was made available to SUNYA in 1988 by a generous donation from IBM Corporation. This one million volt tandem accelerator was used briefly for both ion implantation and materials analysis, but is now dedicated exclusively to high-energy ion implantation.

A very wide range of ions are available for implantation at energies from about 400 keV up to several MeV.