Ion Implantation

The technique of ion implantation is extensively used in industrial activity for shooting foreign atoms into a material. This can be used in such diverse applications as hardening the surfaces of real devices and creating doped layers within computer chips, but in this laboratory it is mostly used to create test samples for entirely new applications.

We have ion implantation systems set up on four different accelerators. The Dynamitron is used for high-energy implantation. The Extrion and Danfysik accelerators are used for low-to-medium energy implantation and the NEC Tandem accelerator is used for high-energy implantation.